SK trichem
About the Company
SK Trichem is, as a joint venture with Tri Chemical Laboratories of Japan, which has long experience in precursor business, is growing rapidly as a domestic No.1 precursor specialist with various semiconductor precursor product portfolios that reflect customer needs and stable production operations, and it plans to grow into a Global Top precursor company by expanding into display and eco-friendly business areas using semiconductor material technology.
SK Trichem produces organometallic compound products which are used to deposit thin films during the process of manufacturing semiconductor devices. The main products are high-k precursors(Hf system, Zr system, Ti system) used for dielectric film deposition using ALD process in DRAM semiconductor production and low-k precursors(Si system) for high-layer 3D NAND production and SiO2 thin film deposition through CVD/ALD process.
Business Objective
Contributing to the competitiveness of Korea’s materials industry
- With world-class technology and production capabilities in the precursor field, SK trichem contributes to the improvement of technological competitiveness in Korea's semiconductor and materials industries.
Trust of Stakeholders
- Based on the operation of safe workplaces centered on SHE(Safety, Health, Environment), the highest level of cost competitiveness / differential quality level / advanced R&D competitiveness
Development of New Materials
- Developing next-generation new materials and growing into a top - tier precursor company by collaborating with customers and various industry and academia institutions and expanding R&D
Site
Stable plant operation through multi-faceted plant operation know-how
Establishment of a dedicated R&D organization for the development of next-generation items
Operation of base offices to immediately respond to customers' needs
Product
Research / development / production / sales of precursor, an organometallic compound for the thin film deposition process of micro semiconductor patterns
| Application | Product | |
|---|---|---|
| Zr-Precursor | ZrO2 thin film deposition via ALD process | CpZr, SKZ300 |
| Si-Precursor | SiO2 thin film deposition via CVD / ALD process | BTBAS, 3DMAS, OMCTS, 4MS |
| Ti-Precursor | TiO2 thin film deposition via ALD process | TiO2 |
| Hf-Precursor | HfO2 thin film deposition via ALD process | CpHf |
SK materials provides Zr precursors and SI precursors for the rapidly growing IT semiconductor industryand is developing high-quality next-generation products such as Ti, Si, and Hf precursorsbased on its novel technology and competitiveness. SK materials, the number-one global provider of specialty gases recognized in the semiconductor market for its reliabilityand customer responsiveness, is collaborating with Tri Chemical Laboratories, a Japanese precursor tech leader.This partnership will serve as a future growth engine that will maximize both profitability and growth.
Precursors, which induce chemical reactions by introducing various types of reactive gases into reactors during semiconductor fabrication, are used to deposit thin films of desired materials is expected with the refinement of semiconductors and the increase in layered structures.
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Zr-Precursor
Zr-precursors are used in the manufacturing of capacitors for semiconductor DRAMs and in the depositing of ZrO2 thin films in the ALD process.
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Si-Precursor
Si-precursors are used in the manufacturing of semiconductor DRAMs and 3D-NAND and in the depositing SiO2 thin films in the CVD/ALD process.
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Ti-Precursor
Ti-precursors are used in the manufacturing of capacitors for semiconductor DRAMs and in the depositing TiO2 thin films in the ALD process.
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Hf-precursor
Used in the fabrication process of DRAM capacitors for semiconductor devices. Also used in HfO2 thin-film deposition as part of the ALD process.