SK materials manufactures and sells precursors based on consistent research
and development on specialized materials for next-generation processes.
SK materials provides Zr precursors and SI precursors for the rapidly growing IT semiconductor industry
and is developing high-quality next-generation products such as Ti, Si, and Hf precursors
based on its novel technology and competitiveness. SK materials, the number-one global provider of specialty gases recognized in the semiconductor market for its reliability
and customer responsiveness, is collaborating with Tri Chemical Laboratories, a Japanese precursor tech leader.
This partnership will serve as a future growth engine that will maximize both profitability and growth.
Precursors, which induce chemical reactions by introducing various types of reactive gases into reactors during semiconductor fabrication, are used to deposit thin films of desired materials is expected with the refinement of semiconductors and the increase in layered structures.
Zr-precursors are used in the manufacturing of capacitors for semiconductor DRAMs and in the depositing of ZrO2 thin films in the ALD process.
Si-precursors are used in the manufacturing of semiconductor DRAMs and 3D-NAND and in the depositing SiO2 thin films in the CVD/ALD process.
Ti-precursors are used in the manufacturing of capacitors for semiconductor DRAMs and in the depositing TiO2 thin films in the ALD process.
Used in the fabrication process of DRAM capacitors for semiconductor devices. Also used in HfO2 thin-film deposition as part of the ALD process.