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Dichlorosilane (SiH2Cl2)

SiH2Cl2 is a gas used for nitride (SixNy) deposition.

  • INDIVIDUAL

SPECIFICATION

Unit : ppmv
SPECIFICATION : SiH2Cl2, O2+Ar, N2, CO, CO2, CH4, H2, SiH3Cl, SiHCl3, SiCl4
SiH2Cl2 O2+Ar N2 CO CO2 CF4 H2 SiH3Cl SiHCl3 SiCl4
99.9% 1.0 1.0 1.0 1.0 1.0 10.0 100 100 100
SPECIFICATION : SiH2Cl2, SPECIFICATIO
SiH2Cl2 SPECIFICATIO
Purity SiH2Cl2 99.9%
Impurity
(ppmv)
O2+Ar 1.0
N2 1.0
CO 1.0
CO2 1.0
CH4 1.0
H2 10.0
SiH3Cl 100
SiHCl3 100
SiCl4 100

CYLINDERS INFORMATION

CYLINDERS INFORMATION : TYPE, MATERIAL, FILLING WEIGHT, VALVE CONNECTION TYPE
TYPE MATERIAL FILLING WEIGHT VALVE CONNECTION TYPE
40L SUS 316L 35~40 kg JIS 22L, CGA/DISS636 etc.
10L 8.5~10kg
CYLINDERS INFORMATION : CYLINDERS INFORMATION, MATERIAL, FILLING WEIGHT, VALVE CONNECTION TYPE
CYLINDERS INFORMATION SPECIFICATIO
MATERIAL SUS 316L
FILLING WEIGHT 8.5~10(10Li) / 35~40(40Li) kg
VALVE CONNECTION TYPE JIS 22L, DISS 636 etc.
Purpose of use - Wafer → Substrate In (Wafer, Chamber, Heater) → Processing (Process gases) Zoom In - Semiconductor (Dielectric) SiH2Cl2:Spacer - SiH2Cl2 is a gas used for nitride (SixNy) deposition. → Substrate Out → Semiconductor (Wafer)