Other High-Purity Gases
In addition to manufacturing value-added items that are increasingly
in demand due to the expansion of 3D NAND and microfabrication processes,
SK materials offers various services to its customers, such as sourcing, refinement, and mixing.
Kr is used as a momentum gas in the etching of deep holes in 3D NAND of semiconductors.
SiCl4 is a gas used together with Si powder, at the manufacturing polysilicon wafers. It is also used for deposition and etching during semiconductor fabrication.
Helium is an inert gas used across industries as a carrier gas, purge gas, cooling gas, tracer gas for leak detection, or entertaining gas.