乙硅烷 (Si2H6)

乙硅烷用于半导体微细化工艺, 在沉积形成薄膜时, 可在低温中快速形成均匀的薄膜。

  • INDIVIDUAL

SPECIFICATION

Unit : ppmv
Si2H6 O2+Ar N2 CO2 CH4 SiH4 Si3H8 Si4H10 Chlorosilane Siloxane H20
99.99%
[Excluded SiH4, Si3H8, Si4H10]
1.0 2.0 1.0 1.0 500 50 50 0.2 3.0 1.0
Si2H6 SPECIFICATIO
Purity Si2H6 99.99%
[Excluded SiH4, Si3H8, Si4H10]
Impurity O2+Ar 1.0
N2 2.0
CO2 1.0
CH4 1.0
SiH4 500
Si3H8 50
Si4H10 50
Chlorosilane 0.2
Siloxane 3.0
H2O 1.0

CYLINDERS INFORMATION

TYPE MATERIAL FILLING WEIGHT VALVE CONNECTION TYPE
47L Cr-Mo Steel, Mn Steel 3 / 10 / 12 kg JIS-22-14L,
CGA/DISS 632 etc.
47L SPECIFICATIO
MATERIAL Cr-Mo Steel, Mn Steel
FILLING WEIGHT 3 / 10 / 12 kg
VALVE CONNECTION TYPE JIS-22-14L, CGA/DISS632 etc.